Manufacturing technology field

The surface properties required for cutting tools and press dies are becoming increasingly stringent year by year. To achieve a surface that does not wear even when subjected to high surface pressure in high-temperature environments exceeding 1000°C, a new concept that breaks away from conventional film structure designs is required. Our laboratory has been conducting research and development on thin films, mainly hard nitride thin films, aiming to form highly tough films that have excellent heat resistance and wear resistance even in high-temperature environments.

HIPIMS deposition of TiAlN films on
inner wall of micro-dies and
its　applicability in
micro-sheet metal forming

Deposition of hard TiAlN thin films on the inner surface of micro-molds and application to microforming by the HiPIMS method

Impact of pulse duration in
high power impulse magnetron sputtering on the low-temperature growth of
wurtzite phase (Ti,Al)N films
with high hardness

Effect of HiPIMS pulse frequency on low-temperature thin-film growth of hexagonal TiAlN thin films with high hardness

Pressure dependence of (Ti, Al)N film growth on inner walls of small
holes in high-power impulse magnetron sputtering

Pressure dependence of TiAlN thin film growth on the inner surface of micropores using the HiPIMS method

Variation of local chemical compositions
of (Ti, Al)N films on inner wall of
small hole deposited by
high-power impulse magnetron sputtering

Changes in the local chemical composition of TiAlN thin films deposited on the inner surface of micropores by HiPIMS.

Manufacturing technology field

HIPIMS deposition of TiAlN films on inner wall of micro-dies and its applicability in micro-sheet metal forming

Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Pressure dependence of (Ti, Al)N film growth on inner walls of small holes in high-power impulse magnetron sputtering

Variation of local chemical compositions of (Ti, Al)N films on inner wall of small hole deposited by high-power impulse magnetron sputtering

HIPIMS deposition of TiAlN films on
inner wall of micro-dies and
its　applicability in
micro-sheet metal forming

Impact of pulse duration in
high power impulse magnetron sputtering on the low-temperature growth of
wurtzite phase (Ti,Al)N films
with high hardness

Pressure dependence of (Ti, Al)N film growth on inner walls of small
holes in high-power impulse magnetron sputtering

Variation of local chemical compositions
of (Ti, Al)N films on inner wall of
small hole deposited by
high-power impulse magnetron sputtering